23

Thermal analysis of photoresists in aid of lithographic process development

Year:
1997
Language:
english
File:
PDF, 257 KB
english, 1997
31

Surface and line-edge roughness in plasma-developed resists

Year:
2001
Language:
english
File:
PDF, 642 KB
english, 2001
47

Surface Silylation: Chemistry and Process Issues.

Year:
2001
Language:
english
File:
PDF, 710 KB
english, 2001